Designed for the precision, throughput, and repeatability demands of semiconductor and industrial inspection — from wafer-level defect detection to inline quality assurance. Domain-aware pipelines that speak the language of your imaging stack natively.
SEM / FIB-SEMTEMSTEMOptical / brightfieldDark-fieldConfocalX-ray / CTIR imagingMulti-channel
Deployed on commercial SEM and STEM instruments in production environments.
Segments
Built for every stage of the inspection pipeline
Semiconductor and industrial imaging demands absolute precision. OptiFlow's domain-aware engine is built to the tolerances your process requires — whether you're hunting nanoscale defects or enforcing inline quality standards at production speed.
Segment 01
Defect Detection
Find every defect before it finds your yield
Defect detection in semiconductor imaging demands sensitivity to features at the limits of resolution — while maintaining throughput across production volumes. OptiFlow offers both supervised and unsupervised detection approaches, so you can catch known defect classes reliably and discover novel failure modes before they become yield-limiting events.
Manual inspection bottlenecks. Human review cannot scale to production image volumes — defects are missed, throughput suffers, and operator fatigue introduces inconsistency.
Novel defect discovery. Supervised models only catch defect classes they've been trained on — novel failure modes go undetected until yield impact becomes visible.
False positive burden. Overly sensitive detectors flag non-defects for review — wasting engineering time and slowing line throughput.
Variability across imaging conditions. Models trained under one set of imaging parameters fail when lighting, magnification, or sample preparation changes — requiring constant retraining.
Relevant modules
Supervised defect detection
Train on your own defect library — achieves human-expert accuracy on known defect classes at production throughput
Unsupervised anomaly detection
No labelled defects needed — learns normal surface appearance and flags deviations automatically
Object detection & segmentation
Precise localisation and boundary delineation of defect regions across SEM and optical modalities
PDF & Excel reporting
Structured inspection reports with annotated defect maps, counts, and spatial distribution statistics
Segment 02
Wafer Inspection
Full-wafer coverage. Zero compromise on resolution.
Wafer-level inspection requires analysing large image mosaics at high resolution — identifying defects, particles, and pattern irregularities across the entire wafer surface while maintaining spatial traceability back to die coordinates. OptiFlow's domain-aware pipelines handle the image volume, normalise across fields of view, and deliver spatially referenced defect maps ready for process engineering review.
Large-area image handling. Full-wafer mosaics at production resolution generate data volumes that generic tools cannot handle without stitching artefacts or field-to-field inconsistency.
Illumination variation across fields. Uneven illumination across a wafer surface introduces false signals that corrupt defect maps if not corrected upstream.
Spatial traceability. Defect locations must be mapped back to die coordinates and process steps — generic image tools have no awareness of wafer geometry.
Pattern noise vs true defects. Distinguishing genuine defects from process-induced pattern variation requires domain-specific normalisation that generic detectors cannot provide.
Relevant modules
Image enhancement & correction
Illumination correction and normalisation across large-area mosaics — eliminating field-to-field variation before detection
Supervised defect detection
Wafer-aware defect classification trained on your process node's specific defect library
Morphological analysis
Per-defect measurements — area, aspect ratio, orientation — with spatial mapping to wafer coordinates
Statistical analysis & reporting
Wafer-level defect density maps, spatial clustering analysis, and process engineering reports
Segment 03
Quality Assurance
Inline inspection at production speed
Inline QA requires the analytical pipeline to keep pace with the production line — delivering decisions in near real-time without sacrificing detection sensitivity. OptiFlow's domain-aware workflows are designed for deployment at scale: reproducible across shifts, operators, and imaging systems, with full audit traceability for regulated manufacturing environments.
Throughput vs sensitivity trade-off. Fast inspection misses subtle defects; thorough inspection slows the line — generic tools force this compromise rather than resolving it.
Operator and shift variability. Manual or semi-automated QA introduces subjectivity that varies between operators and shifts — undermining process control data.
Reproducibility across systems. Pipelines that work on one imaging station fail on another when camera, lighting, or optics differ — requiring per-station calibration and retraining.
Audit and traceability requirements. Regulated manufacturing environments require full documentation of inspection decisions — which generic image tools do not natively support.
Relevant modules
Supervised defect detection
Production-calibrated detection models with confidence scoring for automated pass/fail decisions
Unsupervised anomaly detection
Continuous monitoring for process drift and novel defect emergence — no retraining required for new failure modes
Texture analysis
Surface texture characterisation for detecting process-induced variation before it manifests as visible defects
PDF & Excel reporting
Audit-ready inspection logs with full pipeline parameter traceability for regulatory and process engineering use
Ready to see it on your imaging data?
Book a live demo with your own wafer or inspection images — we'll show you the most relevant capabilities, and if your process needs something we haven't built yet, we'll work with you to build it.